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Autor Morlanes Calvo, Tomás |
Documentos disponibles escritos por este autor (5)
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Sánchez Brea, Luis Miguel ; Torcal Milla, Francisco José ; Salgado Remacha, Francisco Javier ; Morlanes Calvo, Tomás ; Jiménez Castillo, Isidoro ; Bernabeu Martínez, Eusebio | The Optical Society Of America | 2010-06-10We present a collimation technique based on a double grating system to locate with high accuracy an emitter in the focal plane of a lens. Talbot self-images are projected onto the second grating producing moiré interferences. By means of two pho[...]texto impreso
Saez Landete, José ; Alonso Fernández, José ; Sánchez Brea, Luis Miguel ; Morlanes Calvo, Tomás ; Bernabeu Martínez, Eusebio | Optical Society of America | 2009-09-01Two-grating measurement systems are routinely employed for high-resolution measurements of angular and linear displacement. Usually, these systems incorporate zero reference codes (ZRCs) to obtain a zero reference signal (ZRS), which is used as [...]texto impreso
Herrera Fernández, José María ; Sánchez Brea, Luis Miguel ; Torcal Milla, Francisco José ; Morlanes Calvo, Tomás ; Bernabeu Martínez, Eusebio | IOP Publishing | 2016-06-14We propose an accurate technique for obtaining highly collimated beams, which also allows testing the collimation degree of a beam. It is based on comparing the period of two different self-images produced by a single diffraction grating. In thi[...]texto impreso
Sánchez Brea, Luis Miguel ; Torcal Milla, Francisco José ; Morlanes Calvo, Tomás | Optical Society of America | 2016-09-09In this Letter, we analyze the near-field diffraction pattern produced by chirped gratings. An intuitive analytical interpretation of the generated diffraction orders is proposed. Several interesting properties of the near-field diffraction patt[...]texto impreso
Morlanes Calvo, Tomás ; Peña, José Luis de la ; Sánchez Brea, Luis Miguel ; Alonso Fernández, José ; Crespo Vázquez, Daniel ; Saez Landete, José ; Bernabeu Martínez, Eusebio | Society of Photo-Optical Instrumentation Engineers (SPIE) | 2005In this work, an optoelectronic device that provides the absolute position of a measurement element with respect to a pattern scale upon switch-on is presented. That means that there is not a need to perform any kind of transversal displacement [...]