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Título:
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Montaje y calibración de un sistema de pulverización multicátodo
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Autores:
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Caudevilla Gutiérrez, Daniel
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Tipo de documento:
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texto impreso
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Fecha de publicación:
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2018-06
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Dimensiones:
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application/pdf
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Nota general:
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info:eu-repo/semantics/openAccess
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Idiomas:
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Palabras clave:
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Estado = No publicado
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Materia = Ciencias: Física: Electricidad
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Materia = Ciencias: Física: Electrónica
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Tipo = Trabajo Fin de Máster
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Resumen:
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We will present in this work the design and assembling of a radiofrequency multicathode sputtering system. The system is water refrigerated and its vacuum system is able to reach vacuum in the range 10? ? mbar. It is designed for deposition and growth of thin metallic films for ohmic contacts on n- and p-type silicon. The system has been calibrated to use with three different cathodes, which all of them are assembled in the same chamber. The sample holder can be orientated in different positions for facing the targets and also to a blind position for cleaning processes. The targets used in the system are titanium, aluminum and tungsten. To perform the system calibration we have prepared different samples by lithography and we performed profilometry measurements to know the thickness of the deposited material.
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En línea:
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https://eprints.ucm.es/id/eprint/49384/1/TFM_Daniel_Caudevilla_2017-18.pdf
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