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Título:
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Nano-laminate vs. direct deposition of high permittivity gadolinium scandate on silicon by high pressure sputtering
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Autores:
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Feijoo, P.C. ;
Pampillón Arce, María Ángela ;
San Andres Serrano, Enrique ;
Fierro, J.L.G.
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Tipo de documento:
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texto impreso
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Editorial:
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Elsevier Science SA, 2015-10-30
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Dimensiones:
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application/pdf
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Nota general:
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info:eu-repo/semantics/openAccess
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Idiomas:
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Palabras clave:
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Estado = Publicado
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Materia = Ciencias: Física: Electricidad
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Materia = Ciencias: Física: Electrónica
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Tipo = Artículo
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Resumen:
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In this work we use the high pressure sputtering technique to deposit the high permittivity dielectric gadolinium scandate on silicon substrates. This nonconventional deposition technique prevents substrate damage and allows for growth of ternary compounds with controlled composition. Two different approaches were assessed: the first one consists in depositing the material directly from a stoichiometric GdScO_(3) target; in the second one, we anneal a nano-laminate of
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En línea:
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https://eprints.ucm.es/35321/1/SanAndr%C3%A9s%2003postprint%2Bembargo%2030_10_2017.pdf.pdf
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